Canon
FPA 3000 i 4 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
SUSS MicroTec
MA 6 Mask
Lithography
The SUSS MA 6 Mask Aligner is a semiconductor lithography tool used for mask alignment and exposure, supporting various wafer sizes and featuring infrared alignment and a split-field microscope.
Quintel
Q 7000 Mask
Lithography
The Quintel Q 7000 Mask is a mask aligner used for lithography.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
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