Quintel
Q 7000 Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedMask aligners are lithography tools that bring a photomask into alignment with a substrate and then expose photosensitive material to transfer a pattern. Mask aligners are commonly used where direct mask based exposure is appropriate for device, sensor, MEMS, packaging, and related microfabrication work.
How it works
General reference — not yet source-verifiedMask aligners generally position a substrate beneath or near a patterned mask, use alignment optics to register features on the substrate to features on the mask, and then expose the resist through the mask. Mask aligners commonly combine substrate handling, mask holding, alignment imaging, exposure illumination, and operator or automated setup functions in one tool.
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners sit at the pattern transfer stage of lithography after resist coating and soft bake. Mask aligners are used before development, pattern inspection, and the follow-on pattern transfer or material modification steps such as etch, lift-off, plating, or implant masking.
Applications
The only stated application detail for the Quintel Q 7000 Mask is that it is a mask aligner used for lithography.[3]
What do the numbers mean?
Optics & imaging4
- complete with Optek QTL2001 optics and IR illumination package[2]
Configuration & options2
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- EV Group 620 Mask— Same function class: Lithography, UnknownCompare in depthsource[2]
- SUSS MicroTec MA 8 BA 8 Gen 5 S Compact Mask— Same function class: Lithography, UnknownCompare in depthsource[2]
- Canon FPA 3000 i 4— Same function class: Lithography, nullCompare in depthsource[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Q 7000 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Q 7000 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Q 7000 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Q 7000 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Q 7000 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Q 7000 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]inventory listing
- [3]Q 7000 Mask — Quintel | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 19, 2026.
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The Canon FPA 3000 i 4 is a lithography stepper or fine pattern aligner for semiconductor wafer pattern transfer.
The SUSS MicroTec MA 8 BA 8 Gen 5 S Compact Mask is a lithography tool described as a compact mask aligner for imprint processing.
The EVG 620 Mask Aligner is a mask alignment tool for semiconductor manufacturing, supporting wafer sizes from 2 to 12 inches.