Denton Vacuum
635LL alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
ASM
E 2000 Epitaxial Reactor
200mm
Deposition
The ASM E 2000 is a radiantly heated, single-wafer epitaxial reactor for chemical vapor deposition of doped or undoped silicon layers on wafers up to 200 mm (8 inches).
SPTS
MVD100E
200mm
Deposition
The SPTS MVD100E is a Molecular Vapor Deposition system designated for R&D or pilot manufacturing.
SPTS
MVD300
200mm
Deposition
The SPTS MVD300 is a Molecular Vapor Deposition system designed for high-performance, flexible, reliable high-volume manufacturing applications.
Applied Materials
0010-13622 RF Match for
Deposition
Oxford Instruments
100
Deposition
CEE
100 CB Spin
Deposition
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