Plasma-Therm
SLR-770 alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Oxford Instruments
100 ICP Fluorine
Etch
Tegal
1511e
three- to six-inch wafers
Etch
The Tegal 1511e is a tri-electrode dual-frequency plasma etch system for processing three- to six-inch wafers.
Lam Research
2300
8"
Etch
Lam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.
Lam Research
2300 e 4 Exelan Flex ES Dielectric
Etch
Lam Research
2300 e 4 Exelan Flex GX Dielectric
Etch
Lam Research
2300 e 4 Exelan GX
Etch
The Lam 2300 e 4 Exelan GX is an etcher used in semiconductor manufacturing.
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