Tegal
1511e
Wafer size
three- to six-inch wafers
Produced
1984–
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- semiconductors
- telecommunications devices
- optoelectronic devices
- high-performance wireless and data applications
What do the numbers mean?
Vacuum & pumping1
Wafer handling1
Configuration & options2
Vintage & configurations
- 1984Production start[1]
First sold in 1984.
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- system characteristicfirst vacuum-loadlocked dual-frequency tri-electrode etch system[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 1511e are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the 1511e are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1511e are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1511e are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 1511e is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 1511e are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
Last updated Jul 29, 2026.
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General referenceLam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.