SPTS
MVD100E alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
Denton Vacuum
635LL
200mm
Deposition
ASM
E 2000 Epitaxial Reactor
200mm
Deposition
The ASM E 2000 is a radiantly heated, single-wafer epitaxial reactor for chemical vapor deposition of doped or undoped silicon layers on wafers up to 200 mm (8 inches).
SPTS
MVD300
200mm
Deposition
The SPTS MVD300 is a Molecular Vapor Deposition system designed for high-performance, flexible, reliable high-volume manufacturing applications.
Applied Materials
0010-13622 RF Match for
Deposition
Oxford Instruments
100
Deposition
CEE
100 CB Spin
Deposition
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare MVD100E with another model →