SPTS
MVD300 alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
Denton Vacuum
635LL
200mm
Deposition
ASM
E 2000 Epitaxial Reactor
200mm
Deposition
The ASM E 2000 is a radiantly heated, single-wafer epitaxial reactor for chemical vapor deposition of doped or undoped silicon layers on wafers up to 200 mm (8 inches).
SPTS
MVD100E
200mm
Deposition
The SPTS MVD100E is a Molecular Vapor Deposition system designated for R&D or pilot manufacturing.
Applied Materials
0010-13622 RF Match for
Deposition
Oxford Instruments
100
Deposition
CEE
100 CB Spin
Deposition
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare MVD300 with another model →