SUSS MicroTec
ACS 300 Gen 2 alternatives
Comparable semiconductor equipment documented in the Waferpedia catalog.
6 comparable tools
Novellus
300
300mm
Novellus ATHENA software is available for Novellus 300 mm tools that use the Proteus user interface.
CHA
SE600
300mm
The JEOL JBX-9500FS Electron Beam Lithography System can load substrates from 10 mm pieces to 300 mm wafers and write features less than 10 nm in size.
Tri
-Mist 850 Electronic Air Filter
KLA
.498 PSL Wafer
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
Applied Materials
0010 47763
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-03254 E Chuck
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