Tool family
The Aixtron AIX G 10 is a chemical vapor deposition (CVD) system with a 6-inch wafer size.
The Aixtron AIX G 4 is a 4-inch deposition system for GaN epitaxy processes.
The Aixtron AIX G 5 + C is a deposition equipment model.
The Aixtron AIX G 5 WW EPI Reactor is an epitaxial silicon deposition system for 4-inch wafers.
The Aixtron AIX R 6 is a metal organic chemical vapor deposition system.
The Aixtron AIX G 10 is a chemical vapor deposition (CVD) system with a 6-inch wafer size.
The Aixtron AIX G 4 is a 4-inch deposition system for GaN epitaxy processes.
The Aixtron AIX G 5 + C is a deposition equipment model.
The Aixtron AIX G 5 WW EPI Reactor is an epitaxial silicon deposition system for 4-inch wafers.
The Aixtron AIX R 6 is a metal organic chemical vapor deposition system.