Aixtron

AIX G 4

Research Quality: 50% complete

The Aixtron AIX G 4 is a deposition system for epitaxial processes. The Aixtron AIX G 4 processes 4-inch wafers for GaN deposition. The Aixtron AIX G 4 uses process gases NH3, H2, and SiH4.^[1]

AIX G 4 — Inventory photo — Fig. 01AIX G 4Inventory photo^[1]

Power

3 Phase^[1]

Vacuum

Main Pump^[1]

Gas delivery

NH3, H2, SiH4^[1]

What it is

The Aixtron AIX G 4 is a deposition system for epitaxial growth of gallium nitride (GaN).^[1]

How it works

General reference — not yet source-verified

MOCVD reactors like the AIX G 4 operate by delivering metalorganic precursors and hydride gases into a heated reaction chamber, where the gases decompose and deposit epitaxial layers onto a heated substrate.

Where it fits in the process flow

General reference — not yet source-verified

The AIX G 4 is used in the front-end of semiconductor fabrication for epitaxial deposition, a step that follows substrate cleaning and precedes subsequent device patterning and contact formation.

For GaN-based devices, the system typically grows buffer layers, n-type and p-type GaN, and sometimes InGaN quantum wells, with the substrate prepared upstream and the epiwafer moving downstream to lithography and etch processes.

What do the numbers mean?

Power & electrical5

Phase: 3 Phase^[1]
Voltage: 208V^[1]; RF Generator^[1]
Power: 3 Phase - 208V^[1]
RF Generator: Included^[1]

Vacuum & pumping2

Main Pump^[1]
Main Pump: Included^[1]

Wafer handling1

Wafer Size: 4 inch^[1]

Gas & chemistry4

Process Gas: NH3, H2, SiH4^[1]
Process Gas: NH3^[1]
Process Gas: H2^[1]
Process Gas: SiH4^[1]

Configuration & options13

Process: EPI^[1]
Process: GaN^[1]; Glove Box^[1]; GMS^[1]; Particle Filter^[1]; Cable Box^[1]; Transformer^[1]
Vintage: 2009^[1]
Glove Box: Included^[1]
GMS: Included^[1]
Particle Filter: Included^[1]
Cable Box: Included^[1]
Transformer: Included^[1]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Phase3 Phase^[1]
Voltage208V^[1]
Process GasNH3, H2, SiH4^[1]
ConfigurationMain Pump^[1]
ConfigurationRF Generator^[1]
Process GasNH3^[1]
Process GasH2^[1]
Process GasSiH4^[1]
Power3 Phase - 208V^[1]
Main PumpIncluded^[1]
RF GeneratorIncluded^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the AIX G 4 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AIX G 4 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the AIX G 4 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the AIX G 4 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the AIX G 4 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the AIX G 4 is not on record.
Answerable by: an OEM datasheet or a fab qualification report