Waferpedia

Tool family

Aixtron AIX 2600

AixtronDeposition7 entries

Models in this family

  1. The Aixtron 2600 G 3 HT is a metal organic chemical vapor deposition reactor.

  2. The Aixtron 2600 G 3 IC R is a MOCVD reactor configured for AlInGaP MOCVD epitaxy and 7 x 6-inch wafers.

  3. The Aixtron AIX 2600 G 3 IC R Planetary Reactor is a deposition system described as a 3-phase, 4-wire + ground, 50/60 Hz unit.

  4. The Aixtron AIX 2600 G 3 is a MOCVD reactor for 2, 3, and 4 inch wafers.

  5. The Aixtron AIX 2600 G 3 R is a MOCVD/OMVPE deposition system for GaAs or InP wafers, with wafer sizes stated as 2, 3, 4, and 6 inch.

All entries

  1. 2600 G 3 HT IC MOCVD ReactorAixtron
    CategoryDeposition
    20 specs
  2. 2600 G 3 HT MOCVD ReactorAixtron

    The Aixtron 2600 G 3 HT is a metal organic chemical vapor deposition reactor.

    CategoryDeposition
    24 specs
  3. 2600 G 3 IC R MOCVD ReactorAixtron

    The Aixtron 2600 G 3 IC R is a MOCVD reactor configured for AlInGaP MOCVD epitaxy and 7 x 6-inch wafers.

    CategoryDeposition
    20 specs
  4. AIX 2600 G 3 IC R Planetary ReactorAixtron

    The Aixtron AIX 2600 G 3 IC R Planetary Reactor is a deposition system described as a 3-phase, 4-wire + ground, 50/60 Hz unit.

    CategoryDeposition
    3 specs
  5. AIX 2600 G 3 MOCVD ReactorAixtron

    The Aixtron AIX 2600 G 3 is a MOCVD reactor for 2, 3, and 4 inch wafers.

    CategoryDeposition
    6 specs
  6. AIX 2600 G 3 Planetary ReactorAixtron
    CategoryDeposition
    3 specs
  7. AIX 2600 G 3 R MOCVD OMVPEAixtron

    The Aixtron AIX 2600 G 3 R is a MOCVD/OMVPE deposition system for GaAs or InP wafers, with wafer sizes stated as 2, 3, 4, and 6 inch.

    CategoryDeposition
    7 specs