Tool family
ASML PAS 5500/300 is a deep-UV stepper photolithography tool configured for 4-inch wafers.
ASML PAS 5500/300 is a deep-UV stepper photolithography tool configured for 4-inch wafers.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| PAS 5500/300 | — | — | — | wiki.nanotech.ucsb.edu[1] |
| PAS 5500/200 | i-line | — | Described as a 5x reduction, i-line stepper with 350nm resolution and 0.48-0.60 variable numerical aperture; the source notes a 200 mm wafer context and that higher resolution i-line, KrF, and ArF systems were later introduced in the PAS 5500 line. | manualslib.com[2] |
| PAS 5500/60 | i-line | — | Described as an i-line system with automatic 100mm wafer cassette processing capability, 365nm near-UV light, 450nm minimum feature size, and 90nm alignment between lithographic layers. | snfguide.stanford.edu[3] |
| PAS 5500/275 | i-line | — | Described as a refurbished and upgraded model offering resolutions down to 0.28 µm and throughput of up to 100 wafers per hour. | asml.com[4] |