ASML

The ASML PAS 5500/850 D is a scanner for 6-inch wafers, using a Cymer ELS-6610 light source and supporting R type, 1.2 mm notch and flat wafers.

The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.

ASML PAS 5000 / 55 A is a stepper identified with an option set that includes Wafer Tilt Monitor.

The ASML Twinscan AT 850 D is a semiconductor manufacturing tool offered with a Cymer ELS 7600 or ELS 6610 laser and a Tel Lithius track.

The ASML PAS 5500 / 700 is a Scanner and a Stepper.

The ASML Twinscan 1200 B is a lithography scanner equipped with a Cymer XLA 160 laser, but it is non-operational due to an internal water leak near the lens and has no lens data available.

The ASML PAS 5500/400 is an i-line stepper for 8-inch wafers with a resolution of 280nm, introduced around 2002.

The PAS 2500 series was the first lithography system developed entirely by ASML and became the system that built the company.

The ASML 300 C is a model of equipment manufactured by ASML.

The ASML 2500 / 40 is a stepper with a wafer table, reticle table, P-table, dipod, HP laser, and alignment laser.

The ASML 5500/80 is an i-line wafer stepper with 500nm resolution, <70nm alignment accuracy, and a 21mm x 21mm field size.

ASML model 4022.631.1584 is an Optical Gas Analyzer.

The Twinscan NXT 2050 i is a high-productivity deep ultraviolet immersion lithography system for advanced logic and memory nodes.

The ASML YieldStar S 1375 F is an overlay measurement system for 12-inch wafers.

ASML Twinscan XT 1950 Hi is a scanner for 12-inch wafers used for 193 nm immersion lithography with 38 nm resolution capacity.

The ASML Twinscan XT 1400 F Scanner is a 193nm (ArF) lithography scanner stated to handle 12-inch wafers.

The ASML PAS 5500/300 DUV is a deep ultraviolet (DUV) stepper.

The ASML PAS 5500 / 100 C is a stepper system from 1995.

The ASML ESC 320 RDA is a semiconductor manufacturing equipment item manufactured by ASML.

The ASML YieldStar S 100 is an overlay measurement tool.

The ASML 4022.634.34071 PAAC 325/14 R PPCA is a new, sealed Power Mod (SERV.634.34071) cleanroom product from 2018.

ASML model 4022.480.0062 is a Vacuum Stage described as an air vacuum puck in good working condition.

ASML XT 1400 D ArF Scanner is a lithography scanner described as supporting 8-inch and 12-inch wafers and including a wafer stage.

ASML PAS 5500/300 is a deep-UV stepper photolithography tool configured for 4-inch wafers.

The ASML XT 1700 i is an immersion lithography system from 2006.

The ASML Twinscan XT 1250 D is an ArF scanner stated to use 193 nm.

The ASML Twinscan AT 400 S is an i-line scanner stated to be a 365 nm system from 2001.

The ASML XT 1900 Gi is an immersion scanner described with 193 mm optics, software version 5.1, CIM SECS, and a 40/45 nm process.