ASML

ASML SERV.470.54502 is a sealed cleanroom part designated as an OIU Trackball Assembly.

The ASML Twinscan XT 1700 i Immersion Scanner is a 193nm immersion lithography system described as being used for volume chip production at 45nm mode.

The ASML PAS 5500/350C is a DUV stepper for photolithography, typically used in a cluster with a TEL Clean Track ACT-8 coater/developer for 100 mm wafers. The system dates from 1997.

The ASML PAS 5500 275 i-Line is an i-line stepper for 8 inch wafers.

ASML PAS 5500 / 300 C is a DUV stepper described as a deep ultraviolet lithography system.

The ASML Twinscan NXT 1980 i is a 12-inch wafer lithography scanner that was upgraded from the 1970i model.

The ASML Twinscan XT 400 F is an i-line scanner for 300 mm wafers.

The ASML PAS 5500/400 is an i-line stepper for 8-inch wafers with a resolution of 280nm, introduced around 2002.

The PAS 2500 series was the first lithography system developed entirely by ASML and became the system that built the company.

The ASML TWINSCAN NXE:3400B is an extreme ultraviolet (EUV) lithography scanner designed for volume production at the 7 and 5 nm nodes.

The ASML Twinscan AT 850 D is a semiconductor manufacturing tool offered with a Cymer ELS 7600 or ELS 6610 laser and a Tel Lithius track.

The PAS 2400 is an early photolithography system from ASML that was demonstrated in 1985 and achieved a throughput of 90 wafers per hour.

ASML PAS 5000 / 55 A is a stepper identified with an option set that includes Wafer Tilt Monitor.

The ASML PAS 5500/22 is a stepper used in semiconductor lithography.

The ASML PAS 5500/300 C is a DUV stepper with a 248 nm exposure wavelength and 8 inch wafer support.

The ASML PAS 5500 1100 Wafer is a lithography wafer stepper. The ASML PAS 5500 1100 Wafer is specified for 8 inch wafers.

The ASML Twinscan XT 1250 D is a dry wafer scanner featuring a dual chuck wafer stage and a Cymer XLA165 light source.

The ASML 300 C is a model of equipment manufactured by ASML.

ASML 4022.471.63637 Generic Power Amp PPCA is an ASML board identified by model 4022.471.63637.

The ASML Twinscan AT 1100 is a 193 nm ArF laser-based lithography scanner that processes 200 mm and 300 mm wafers using dual-wafer stage technology.

The ASML AT 850 B is a semiconductor manufacturing system produced by ASML.

The ASML YieldStar S 1375 F is an overlay measurement system for 12-inch wafers.

The ASML YieldStar S 100 B is an overlay measurement system that processes 12-inch wafers.

The ASML Twinscan 1950 i is an immersion scanner used in semiconductor lithography.

The ASML 5000 / 55 B is a stepper that supports 6-inch wafers.

The ASML Twinscan XT 1250 D is an ArF scanner stated to use 193 nm.

ASML model 4022.631.1584 is an Optical Gas Analyzer.

The ASML Twinscan XT 1400 F Scanner is a 193nm (ArF) lithography scanner stated to handle 12-inch wafers.

The ASML Twinscan AT 400 S is an i-line scanner stated to be a 365 nm system from 2001.

The ASML 4022.634.34071 PAAC 325/14 R PPCA is a new, sealed Power Mod (SERV.634.34071) cleanroom product from 2018.

The ASML URS 5000 / 55 B is a stepper that supports 6-inch wafers.

The TWINSCAN NXE:3800E is a dual-stage EUV lithography system designed by ASML for high-volume manufacturing of advanced Logic and Memory chips.

The ASML 4022.634.34071 PAAC 325/14 Interface is a circuit interface module.

The PAS 5500/100 is a step-and-repeat i-line lithography system from ASML, introduced for 0.40 micron production.

The ASML 2500 / 40 is a stepper with a wafer table, reticle table, P-table, dipod, HP laser, and alignment laser.

The ASML YieldStar S 100 is an overlay measurement tool.

The PAS 5500/100 is a step-and-repeat i-line lithography system from ASML introduced for 0.40 micron production.

The ASML PAS 5500 / 300 C Wafer Stepper is a wafer stepper for 6-inch wafers.

The ASML Twinscan XT 1400 F ArF Scanner is a lithography scanner with a process module for 200 mm wafers and a 300 mm conversion kit.

The ASML 60 100 200 Steppers is a lithography tool documented in public sources as a provisional entry with no specifications on record.

The ASML 4022.470.8527 is a PCB-type positioner control panel used in ASML LSE/LSM series lithography systems.

General referenceThe ASML PAS 5500 100 D is a lithography system used in semiconductor manufacturing for patterning integrated circuit features onto wafers, belonging to the broader class of projection aligners that step and repeat or step and scan.

The ASML PAS 5500/300 DUV is a deep ultraviolet (DUV) stepper.

The ASML Twinscan XT 400 F is a lithography scanner. The ASML Twinscan XT 400 F uses i-line illumination and handles 300 mm wafers.

The ASML Twinscan 1700 i-P is a scanner model manufactured by ASML, available with a Cymer XLA 360 laser.

ASML XT 1400 D ArF Scanner is a lithography scanner described as supporting 8-inch and 12-inch wafers and including a wafer stage.

The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.

The ASML PAS 5500/200 is an i-Line stepper for semiconductor lithography.

ASML PAS 5500/300 is a deep-UV stepper photolithography tool configured for 4-inch wafers.

The ASML XT 1700 i is an immersion lithography system from 2006.

The ASML 850 B KrF Scanner is a lithography scanner.