ASML
5500
Plate 01ASML PAS 5500 750 + TEL Act 8 Bundle Available, Wafer size 200mm, Location Asia
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What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- Deep-UV stepper photolithography
- Imaging dense features below 200 nm
- Imaging isolated line structures below 150 nm with effort
- Multiple aligned pattern exposures from multiple masks/reticles in a single session
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Any wafer size other than 4-inch is difficult to work with.
- Small mounted parts can have worse flatness and focus-related uniformity issues.
- Edge bead on irregular pieces can reduce yield and uniformity.
- Multi-layer alignment on mounted parts is difficult.
What do the numbers mean?
Wafer handling4
Optics & imaging5
- Full-field useable exposure area
- intersection of a 31 mm diameter circle and a 22 mm x 27 mm rectangle[2]
Configuration & options4
Vintage & configurations
- 1991Production start[1]
The first-ever PAS 5500 platform was shipped in 1991.
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| PAS 5500/300 | — | — | — | wiki.nanotech.ucsb.edu[2] |
| PAS 5500/200 | i-line | — | Described as a 5x reduction, i-line stepper with 350nm resolution and 0.48-0.60 variable numerical aperture; the source notes a 200 mm wafer context and that higher resolution i-line, KrF, and ArF systems were later introduced in the PAS 5500 line. | manualslib.com[3] |
| PAS 5500/60 | i-line | — | Described as an i-line system with automatic 100mm wafer cassette processing capability, 365nm near-UV light, 450nm minimum feature size, and 90nm alignment between lithographic layers. | snfguide.stanford.edu[4] |
| PAS 5500/275 | i-line | — | Described as a refurbished and upgraded model offering resolutions down to 0.28 µm and throughput of up to 100 wafers per hour. | asml.com[1] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 5500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the 5500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented compatible parts, consumables, or accessories for the 5500 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 5500 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
The operating principle of the 5500 is not documented in this record.
Answerable by: an equipment physicist or OEM application engineer
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]asml.com — asml.comasml.com
- [2]wiki.nanotech.ucsb.edu — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [3]manualslib.com — manualslib.commanualslib.com
- [4]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
Last updated Jul 29, 2026.
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