Tool family
Oxford Instruments Plasmalab
Models in this family
Oxford Instruments Plasmalab 133 is a PECVD (plasma-enhanced chemical vapor deposition) system.
The Oxford Instruments Plasmalab 180 ICP is an inductively coupled plasma (ICP) high-density etching system configured for reactive ion etching, with a maximum substrate size of 150 mm and a current configuration for 100 mm wafers.
All entries
- Plasmalab 133Oxford Instruments
Oxford Instruments Plasmalab 133 is a PECVD (plasma-enhanced chemical vapor deposition) system.
CategoryDeposition2 specs - Plasmalab 180 ICPOxford Instruments
The Oxford Instruments Plasmalab 180 ICP is an inductively coupled plasma (ICP) high-density etching system configured for reactive ion etching, with a maximum substrate size of 150 mm and a current configuration for 100 mm wafers.
CategoryEtch12 specs