Waferpedia

Tool family

Raith EBPG5150

RaithLithography1 entry

The RAITH EBPG5150 is an electron beam lithography system described as a benchmark system for high-throughput, automated, high-precision nanolithography.

Models in this family

  1. The RAITH EBPG5150 is an electron beam lithography system described as a benchmark system for high-throughput, automated, high-precision nanolithography.

    Cited variants

    DesignationGenerationVintageChangesSource
    EBPG5150 PlusListed with the same 6-inch laser stage and 155 mm travel range; separate from EBPG5200 Plus, which is listed with an 8-inch laser stage and 210 mm travel range.web.archive.org[1]
    EBPG5200 PlusSame 8-inch laser stage (210 mm travel range); 40 λ/4096 (0.15 nm) advanced; positional drift < 20 nm / h (open loop).web.archive.org[1]

Sources

Sources (1)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org