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Raith

EBPG5150

LithographyRaith EBPG5150 family
Research Quality: 30% complete
RaithEBPG5150
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What is it?

The sources describe the EBPG line as RAITH's electron beam lithography product family, with the EBPG positioned for production environments, industrial R&D, and centers of excellence. The EBPG5150 variant is listed with a 6-inch laser stage and the line is described with features including automated wafer and multi-sample exposures, high-resolution lithography below 5 nm, and a maximum beam current of 350 nA.

What can it run?

Process applications and technology nodes documented for this tool.

  • semiconductors
  • optoelectronics
  • quantum technologies
  • quantum sensors
  • quantum computing
  • quantum communication
  • photonic integrated circuits
  • laser
  • high frequency devices / wireless communication

What do the numbers mean?

Wafer handling1

exposure capability
Automated wafer and multi-sample exposures[2]
Accurate?

Optics & imaging8

product family
Electron Beam Lithography[1]
Accurate?
column technology
Robust 100 kV column technology[2]
Accurate?
lithography resolution
below 5 nm[2]
Accurate?
overlay accuracy
≤ 5 nm[2]
Accurate?
stitching accuracy
≤ 8 nm[2]
Accurate?
stage size
same 6-inch laser stage (155 mm travel range)[2]
Accurate?
laser interferometer resolution
10 λ/1024 (0.6 nm) standard[2]
Accurate?
positional drift
< 25 nm / h[2]
Accurate?

Performance1

description
Highest throughput, automation, and precision[2]
Accurate?

Control & software1

control software
Digital RAITH Beams[2]
Accurate?

Configuration & options3

system line
EBPG[2]
Accurate?
beam current
up to 350 nA[2]
Accurate?
thermo-calibration system
standard[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
EBPG5150 PlusListed with the same 6-inch laser stage and 155 mm travel range; separate from EBPG5200 Plus, which is listed with an 8-inch laser stage and 210 mm travel range.web.archive.org[2]
EBPG5200 PlusSame 8-inch laser stage (210 mm travel range); 40 λ/4096 (0.15 nm) advanced; positional drift < 20 nm / h (open loop).web.archive.org[2]
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the EBPG5150 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EBPG5150 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the EBPG5150 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EBPG5150 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EBPG5150 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the EBPG5150 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.orgweb.archive.org
  3. [3]EBPG Archives - RAITHweb.archive.orgweb.archive.org
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Last updated Jul 29, 2026.

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