Tool family
The Tokyo Electron Trias Metal is a semiconductor processing system that supports metal chemical vapor deposition (CVD) for Ti/TiN and metal etching, and handles 300 mm (12-inch) wafers.
The TEL Trias is a plasma nitridation deposition system handling 8-inch and 12-inch wafers.
The Tokyo Electron Trias Metal is a semiconductor processing system that supports metal chemical vapor deposition (CVD) for Ti/TiN and metal etching, and handles 300 mm (12-inch) wafers.
The TEL Trias is a plasma nitridation deposition system handling 8-inch and 12-inch wafers.