Waferpedia

Tool family

Varian Viision 200

Models in this family

  1. Viision 200produced 1996

    The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.

    Cited variants

    DesignationGenerationVintageChangesSource
    Viision 200, 8" - Medium CurrentDescribed as medium current.Equipment inventory listing[1]
    Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2000 Vintage2000Described as high current with 3 phase, 5 wire, 208 volt, 50/60 Hz, and 2000 vintage.Equipment inventory listing[2]
    Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2013 Vintage2013Described as high current with 3 phase, 5 wire, 208 volt, 50/60 Hz, and 2013 vintage.Equipment inventory listing[3]
    VIISion 80LELow energy variant with energy range 250 eV to 80 keVweb.archive.org[4]
    VIISion 200 PLUS2High energy variant with energy up to 200 keVweb.archive.org[4]
    Viision 200 (Medium Current)Medium current configurationEquipment inventory listing[1]
  2. The Varian Viision 200 is an ion implanter for 8-inch wafers.

All entries

  1. Viision 200Varian

    The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.

    CategoryIon Implantation
    13 specs
  2. Viision 200 DiskVarian
    1 spec
  3. Viision 200 IonVarian

    The Varian Viision 200 is an ion implanter for 8-inch wafers.

    CategoryIon Implantation
    39 specs

Sources

Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]web.archive.orgweb.archive.org