Varian Viision 200

Models in this family

1. 

   Viision 200produced 1996–

   The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Viision 200, 8" - Medium Current	—	—	Described as medium current.	Equipment inventory listing[1]
   Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2000 Vintage	—	2000	Described as high current with 3 phase, 5 wire, 208 volt, 50/60 Hz, and 2000 vintage.	Equipment inventory listing[2]
   Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2013 Vintage	—	2013	Described as high current with 3 phase, 5 wire, 208 volt, 50/60 Hz, and 2013 vintage.	Equipment inventory listing[3]
   VIISion 80LE	—	—	Low energy variant with energy range 250 eV to 80 keV	web.archive.org[4]
   VIISion 200 PLUS2	—	—	High energy variant with energy up to 200 keV	web.archive.org[4]
   Viision 200 (Medium Current)	—	—	Medium current configuration	Equipment inventory listing[1]
   VIISion 200 PLUS	—	—	Listed as a 200 keV high current model in the VIISion family.	web.archive.org[4]

2. 

   Viision 200 Disk

   The Varian Viision 200 Disk is semiconductor manufacturing equipment in the Viision 200 family.

3. 

   Viision 200 Ion

   The Varian Viision 200 is an ion implanter for 8-inch wafers.

Sources