Varian

The Varian 350D is a medium current ion implanter that was the tool of choice for semiconductor doping in the early 1980s.

Varian 20L 100V 200W Ion Pump Set is a sold-as-set pair of 20 litre ion pumps with magnet and 304 LN ESR fitting.

The Varian VHS 250 is a diffusion pump used for high vacuum applications.

The Varian P/N: E 11003911 is a scanner assembly.

The Varian E 220 HP is an ion implanter that handles 6-inch and 8-inch wafers.

The Varian Turbo-V 700HT is a microprocessor-controlled, solid-state frequency converter that drives Turbo-V 700 series pumps.

Varian E 500 EHPI Ion Implant System is a 6-inch wafer ion implant system with a Windows 7 control computer and V15.10.12 software.

The Varian Clinac 21EX Silhouette is a high-energy linear accelerator model produced by Varian, with a Silhouette option available for smaller room sizes and featuring 80-leaf or 120-leaf MLC configurations.

The Varian CC2 is a vacuum gauge controller that is part of the Denton Discovery 18 sputter deposition system.

The Varian 2300C/D is a variant of the Clinac 2100C/2100CD medical linear accelerator, manufactured from 1987 to 2007.

The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.

The Varian E 500 Medium Current is an ion implanter for 8-inch wafers, introduced around 1996.

The Varian LN 2 Control is a liquid nitrogen control unit. The Varian LN 2 Control operates at 115 Vac and 3 Amp.

The Varian 2100CD is a high-energy linear accelerator manufactured between 1987 and 2007, part of the Clinac 2100 series, equipped with klystron power source, electron energies, and optional portal imaging, with multi-leaf collimator options of 80 or 120 leaves, and specifiable as 2100C/D or 2100CD variants.

The Varian E 500 EHP is a medium current ion implanter that supports 6-inch wafers, includes a thin wafer handling kit, can be converted to 8-inch, and runs on 208V 3-phase 50/60 Hz power.

The Varian VHS 4 is a vacuum pump with a pumping speed of 1200 l/s.

The Varian Viision 200 is an ion implanter for 8-inch wafers.

The Varian Viision 200+ (also known as Viision 200 Plus and VIISion 200) is a high current ion implanter used for semiconductor wafer processing.

The Varian 981 2523 is a UHV sample manipulator.

The Varian E1000 is an ion implanter manufactured by Varian.

Varian Viision 80 is a medium current ion implanter with an 8-inch wafer size.

The Varian EHP 500 is a tool compatible with 8-inch wafers.

The Varian 948 is a helium mass spectrometer leak detector in the 947/948/960 family that includes a nitrogen cold trap.

The Varian 3118 is an electron beam evaporator system used for semiconductor thin film deposition, optical coating, and advanced materials research.

The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.

The Varian EHPI 500 Medium Current is a medium-current ion implanter.

The Varian 921 066 is a pump controller.

The Varian Viision 80 is an ion implanter.

The Varian 640 IR is a Fourier Transform Infrared (FT-IR) spectrometer designed for mid-IR and near-IR spectroscopy.

The Varian M 2 i is a sputtering system for 6-inch wafers.

The Varian 929 5000 Pump Controller is a pump controller with a 95–130 Vac line input and 1100 Va / 250 Va electrical input ratings.

The Varian E 220 is an ion implanter described as a 3-phase, 5-wire, 208-volt system with E-clamp 6" capability and single-blade processing.

The Varian E 500 High Current Implanter is a high-current ion implanter for 6-inch wafers.

The Varian Kestrel 650 is an ion implanter for 200mm wafers.

The Varian E 500 HP is a medium current ion implanter with a 6-inch wafer size.

The Varian E 11003931 is a neutral beam dump manufactured by Varian.

The Varian E 500 EHPI is a medium current ion implanter used for doping semiconductor wafers.

The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.

The Varian V 700 HT is a turbomolecular pump system that includes a controller.

Varian 911-5039 is a 60L ion pump with magnet and heat shields, rated at 100V and 500W.

The Varian E 500 EHP Ion is an ion implanter in the Ion Implantation category.

The Varian Kestrel II 750 is a high-current ion implanter with an energy range of 10 to 3750 kV and processes 8-inch wafers in batches of up to 10 wafers.

The Varian EHP 500 Ion Implanter is an ion implantation tool with 8 inch wafer support.

The Varian NCR 3117 is a bell jar evaporative coater used for thin film deposition.

The Varian E 11004390 Accelerator Column is a component used in semiconductor manufacturing equipment.

The Varian E 220 HP is an ion implanter that handles 6-inch and 8-inch wafers.

The Varian Kestrel 750 is an ion implanter that handles 200 mm wafers and is classified as a MEV Implanter.

Varian 9699507 S 010 Pump Controller is a pump controller with stated electrical input specifications of 120 V, 50–60 Hz, and 350 Va.

The Varian PTS 300 Leak Checker Scroll Pump is a tri-scroll vacuum pump with a rebuilt, working unit listed at 100-115V / 200-230V and 60/50 Hz.

The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.

The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.

The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.