Varian
Viision 200
The Varian Viision 200 is a batch-process high current ion implanter for 200 mm wafers. The VIISion 200 was introduced in 1996. The system includes variants such as the VIISion 200 PLUS2 with energies up to 200 keV and the VIISion 80LE with energies down to 250 eV.[1]
Produced
1996–
Power
3 Phase[3]
What it is
General reference — not yet source-verifiedThe Viision 200 belongs to the class of ion implantation equipment used to introduce dopant atoms into semiconductor substrates in a controlled way.
How it works
General reference — not yet source-verifiedAn ion implanter accelerates ions and directs the ion beam into a wafer surface to modify electrical properties near the surface region.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation sits in the front end of semiconductor device fabrication and follows earlier wafer preparation and masking steps.
The process is used before later thermal steps that activate implanted dopants and repair implantation damage.
Applications
General reference — not yet source-verifiedIon implantation is used to form doped regions for semiconductor devices and to tune conductivity and junction depth.
What do the numbers mean?
Power & electrical7
Wafer handling2
Configuration & options19
Vintage & configurations
- 1996Production start[1]
Introduction of the VIISion series
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Viision 200, 8" - Medium Current | — | — | Described as medium current. | Equipment inventory listing[2] |
| Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2000 Vintage | — | 2000 | Described as high current with 3 phase, 5 wire, 208 volt, 50/60 Hz, and 2000 vintage. | Equipment inventory listing[3] |
| Viision 200, 8" - High Current - 3 Phase - 5 Wire - 208 Volt - 50/60 Hz 2013 Vintage | — | 2013 | Described as high current with 3 phase, 5 wire, 208 volt, 50/60 Hz, and 2013 vintage. | Equipment inventory listing[4] |
| VIISion 80LE | — | — | Low energy variant with energy range 250 eV to 80 keV | web.archive.org[1] |
| VIISion 200 PLUS2 | — | — | High energy variant with energy up to 200 keV | web.archive.org[1] |
| Viision 200 (Medium Current) | — | — | Medium current configuration | Equipment inventory listing[2] |
| VIISion 200 PLUS | — | — | Listed as a 200 keV high current model in the VIISion family. | web.archive.org[1] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Axcelis GSD 200 E 2 High Current— Same function class: Ion Implantation, nullCompare in depthsource[5]
- Applied Materials VIISta Plad High Current— Same function class: Ion Implantation, nullCompare in depthsource[6]
- Applied Materials VIISta HE XP— Same function class: Ion Implantation, nullCompare in depthsource[7]
- Applied Materials VIISta HCP+— Same function class: Ion Implantation, nullCompare in depthsource[8]
- Applied Materials EHP 500— Same function class: Ion Implantation, nullCompare in depthsource[9]
- Applied Materials E 500 HP— Same function class: Ion Implantation, nullCompare in depthsource[10]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Is the Viision 200 a high current or medium current implanter?
What electrical supply does the Viision 200 require?
The Viision 200 is configured with a 3 phase, 5 wire, 208 Volt, 50/60 Hz electrical supply.[3][4]
When was the VIISion family, including the Viision 200, introduced?
The VIISion family was introduced in 1996.[1]
Not publicly documented
The following facts about the Viision 200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the Viision 200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Viision 200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Viision 200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Viision 200 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Viision 200 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (11)Every fact above is drawn from these public sources
- [1]web.archive.org — vsea.com (Jun 16, 2001)web.archive.org
- [2]Inventory photo
- [3]Inventory photo
- [4]Equipment inventory listing
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]fabsurplus.comfabsurplus.com
- [8]waferpedia.comwaferpedia.com
- [9]Equipment inventory listing
- [10]Equipment inventory listing
- [11]Equipment inventory listing
Last updated Oct 12, 2026.
Compare with similar tools
View all →The Applied Materials / Varian E 500 HP is an implanter described as a medium current ion implantation system for 8-inch wafers.
The Applied Materials / Varian EHP 500 is an ion implanter for 6-inch wafers.
The Axcelis GSD 200 E 2 is a high current implanter with source-stated wafer sizes of 6 inch and 8 inch.
Applied Materials / Varian VIISta HCP+ is a 12-inch high current ion implanter.