Aixtron

2800 G 4 HT MOCVD Reactor

Deposition Aixtron 2800 G 4 HT MOCVD Reactor family

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2800 G 4 HT MOCVD Reactor — Inventory photo — Fig. 012800 G 4 HT MOCVD ReactorInventory photo^[1]

What is it?

What do the numbers mean?

Power & electrical1

Heating System: RF Coil with Trumpf Hunttinger RF Generator TruHeat 7120^[1]

Vacuum & pumping3

Custom Built Exhaust System^[1]
Process Pump: Ebara ESA 70 W or ESA 80 W^[1]
DOR & Glove Box Pumps: Adixen ACP - 15 x 2^[1]

Wafer handling2

Wafer: 6 x 6"^[1]; Ceiling Temperature Control, Custom Built Automatic Ceiling Loader^[1]

Control & software6

Software Version: AIXACT 7.4.1.99^[1]
PLC: 3.12.1 or 3.13.3 (depending on reactor)^[1]
Glove Box: MBraun Nitrogen Glovebox with Controller^[1]
In-Situ Pyrometry: Laytec Pyro 400 with EpiNET 2.2 for Feedback Temperature Control^[1]
Software Version: AIXACT 7.4.1.9^[2]; PLC; 3.12.1^[2]

Configuration & options12

SLC^[1]
Process: InGaN MOCVD Epitaxy^[1]
Metal Organic Source: TMIn x 3, TMGa x 2, TEGa x 2, TMAl x 1, Cp2Mg x 1, Future x 3^[1]
Hydride Source: NH3 x 3, 100 ppm SiH4 in Ar x 2, Future x 2^[1]
Concentration Monitors: Epison4 x 3 for TMIn, Epison4 x 1 for TMAl^[1]; Chiller Baths (6 available for MO Sources)^[1]
Purifiers: Entegris Getters for NH3, H2 & N2^[1]; Filters^[1]
Abatement: Unisem UN 2000 A-WHG (shared across 2 reactors)^[1]
Reactor Chillers: Tek-Temp Recirculating Closed Loop Chiller^[1]; Delivered as a CCS Reactor^[2]; Upgraded^[2]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Heating SystemRF Coil with Trumpf Hunttinger RF Generator TruHeat 7120^[1]
ConfigurationCustom Built Exhaust System^[1]
Process PumpEbara ESA 70 W or ESA 80 W^[1]
DOR & Glove Box PumpsAdixen ACP - 15 x 2^[1]

Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the 2800 G 4 HT MOCVD Reactor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2800 G 4 HT MOCVD Reactor are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 2800 G 4 HT MOCVD Reactor are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 2800 G 4 HT MOCVD Reactor are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 2800 G 4 HT MOCVD Reactor are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 2800 G 4 HT MOCVD Reactor is not on record.
Answerable by: an OEM datasheet or a fab qualification report