Applied Materials
Quantum 120 Leap
What it is
How it works
The Applied Materials Quantum 120 Leap has a 208 V, 3 Phase electrical requirement. The Applied Materials Quantum 120 Leap has a 250 A circuit breaker specification. The Applied Materials Quantum 120 Leap has a single largest load of 90 A for the Beamline Iso TX. The Applied Materials Quantum 120 Leap has an interrupt capacity of 65000 A.[1][2]
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation sits in the device fabrication flow where electrically active regions must be formed or adjusted after earlier film formation and patterning steps. Ion implantation commonly works together with masking layers and is typically followed by thermal processing that activates dopants and repairs implantation damage.
Applications
General reference — not yet source-verifiedIon implanters are used to form doped regions in semiconductor wafers for transistors, wells, source and drain regions, contact-related regions, and other structures that depend on controlled conductivity. Ion implantation is also used for process steps that tune threshold behavior, isolation-related regions, and other patterned modifications of near-surface material properties.
What do the numbers mean?
Power & electrical2
Configuration & options5
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Quantum 120 Leap are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Quantum 120 Leap are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Quantum 120 Leap are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Quantum 120 Leap are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Quantum 120 Leap are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Quantum 120 Leap is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Applied Materials Quantum 120 Leap family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 17, 2026.
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