ASML
Twinscan NXT 2050 i Immersion
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Twinscan NXT:2050i is a deep ultraviolet immersion scanner for high-volume manufacturing at advanced logic and memory nodes. The Twinscan NXT:2050i uses 193 nm ArF immersion optics and an advanced wafer stage design to drive thousands of wafers per day through critical patterning steps.[1]
How it works
The Twinscan NXT 2050 i uses 193 nm argon-fluoride (ArF) immersion optics. A thin layer of water is introduced between the final lens and the wafer to increase the numerical aperture, enabling finer resolution than dry DUV systems. The system employs a dual-stage wafer stage that allows one wafer to be aligned while another is being exposed, reducing idle time. The NXT:2050i is positioned for throughput ranges similar to typical DUV immersion systems, which can exceed 250 wafers per hour under volume conditions.[1][3]
What do the numbers mean?
Wafer handling3
Optics & imaging2
Configuration & options1
Where are the manuals?
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Not publicly documented
Field notes
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Frequently asked questions
What wafer size does the Twinscan NXT 2050 i process?
The Twinscan NXT 2050 i processes 300 mm (12 inch) wafers.[2][3]
Is the Twinscan NXT 2050 i an immersion system?
Yes, the Twinscan NXT 2050 i is an immersion lithography system that uses a thin water layer between the lens and wafer to increase numerical aperture.[1]
What stage design does the Twinscan NXT 2050 i use?
The Twinscan NXT 2050 i uses a dual-stage wafer stage where one wafer is aligned while another is exposed.[1]
What process nodes does the Twinscan NXT 2050 i target?
The Twinscan NXT 2050 i targets critical and non-critical layers in nodes around and below the 10 nm class.[1]
Not publicly documented
The following facts about the Twinscan NXT 2050 i Immersion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Twinscan NXT 2050 i Immersion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Twinscan NXT 2050 i Immersion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Twinscan NXT 2050 i Immersion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Twinscan NXT 2050 i Immersion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Twinscan NXT 2050 i Immersion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]ad-hoc-news.de — ad-hoc-news.dead-hoc-news.de
- [2]Equipment inventory listing
- [3]TWINSCAN NXT:2050i by ASML Holding — Product Research | aVenture — aventure.vcaventure.vc
Last updated Aug 20, 2026.
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