Axcelis

Power
Cryo Compressor 9600V[1]
Vacuum
Without pre-vacuum pumps[1]
Gas delivery
Z-Blok Gasbox (1 Gas string)[1]
Optics
Parallel Lens NV8250P[1]
Ion implanters are semiconductor processing tools that introduce dopant ions into wafer surfaces under controlled beam conditions. Ion implantation is used in device fabrication to form electrically active regions in semiconductor structures.
Ion implantation is a front end semiconductor process that is commonly performed after masking layers define where dopants may enter the wafer. Ion implantation commonly precedes thermal steps that activate dopants and repair implantation damage.
Ion implantation is used to create doped regions in semiconductor wafers for transistor formation and other device structures. Ion implantation is also used for dose-controlled modification of surface electrical properties in integrated circuit manufacturing.
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It is an Axcelis NV 8250 P medium current implanter.[1]
The following facts about the NV 8250 P Medium Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV 8250 P Medium Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV 8250 P Medium Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV 8250 P Medium Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV 8250 P Medium Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV 8250 P Medium Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 19, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.