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101 entries
The Axcelis NV GSD A 80 Ion is an ion implanter.
The Axcelis Fusion M 200 PC is a UV cure system for semiconductor wafer processing.
The Axcelis 6200 A is an ion implanter that accepts 6-inch wafers and supports automatic recipe loading.
The Axcelis Fusion M 200 PCU UV Cure System is a UV cure system designed for 8-inch wafers.
The Axcelis 9355 UPS is a three-phase, double-conversion uninterruptible power supply with internal batteries, an integrated power distribution module, and a maintenance bypass switch.
The Axcelis NV 10 is a silicone vacuum cup.
The Axcelis GSD HE High Energy is an ion implanter for 200 mm wafers.
The Axcelis NV GSD A 80 is an ion implanter.
The Axcelis NV 8200 P is an ion implantation tool.
The Axcelis Optima MD is a medium current ion implanter for 300mm wafers, manufactured from 2006.
The Axcelis NV GSD 200 High Current is a high current ion implanter.
The Axcelis NV 10 160 is an ion implanter that handles wafers from 3 to 6 inches and offers a maximum implant energy of 160 keV.
The Axcelis GSD 200 E is a high current ion implanter available for 6-inch or 8-inch wafers.
The Axcelis GSD 100 High Current is a high current ion implanter that accepts 6-inch wafers.
The Axcelis NV GSD High Energy is an ion implanter for 8-inch wafers.
The Axcelis NV GSD III LE is a high current ion implanter designed for 8-inch wafers, originally manufactured around 2003.
The Axcelis NV GSD III 90 Ion is an ion implanter for 5-inch wafers, manufactured by Axcelis.
The Axcelis GSD 01 X is a semiconductor equipment model from the Axcelis GSD family.
The Axcelis NV GSD HE is an ion implantation system that can handle 6-inch and 8-inch wafers.
The Axcelis ISO 250 SST Flange (P/N 3000521) is a flange used with the Axcelis GSD 200.
Axcelis 17099370 Outer strike plate is an outer strike plate used with the Axcelis GSD 200.
The Axcelis Integra is an etch system for 12-inch wafers.
Axcelis P/N 0692-0006-0001 is an ESC Brush Assembly for ion implanters.
The Axcelis ES 3 Process is a process chamber for 12-inch wafers.
The Axcelis NV 8250 is an ion implanter for 8-inch wafer processing with an energy range of 0-250 keV.
The Axcelis NV GSD 200 E 2 is a semiconductor manufacturing tool for 8-inch wafers.
The Axcelis 9 PX 6000 UPS is an Axcelis equipment model configured with Thermcraft Express-Line Controllers.
Axcelis RapidCure 320 FC RPC is a Thermal / Diffusion tool with a recorded vintage of 2005.
The Axcelis GSD 200 is an ion implanter designed for semiconductor wafer processing, supporting 6-inch and 8-inch wafers.
The Axcelis 200 PC Exposure is a lithography system for 8-inch wafers.
The Axcelis F 300 S & P 300 MT UV Curing System is a UV curing system for semiconductor manufacturing.
The Axcelis 9 PX 11000 is an ion implanter model documented by a single equipment inventory listing.
The Axcelis VHE is an ion implanter described as a 6"-8" wafer convertible system.
The Axcelis OEM# 17099370 is an outer strike plate.
Axcelis RapidStrip 210 ES is an etcher/asher system configured for 8-inch wafers.
The Axcelis Purion M Ion is an ion implantation tool. A listing identifies a unit dated to 2016.
The Axcelis GSD 200 E 2 is a high current ion implanter.
Axcelis P/N 0399-0025-0001 is a Beam Dump Baffle for ion implanters.
General referenceThe Axcelis NV 8200 is an ion implantation system used in semiconductor manufacturing to introduce dopant atoms into a substrate.
The Axcelis Purion H 200 High Current is a single-wafer high current ion implanter.
General referenceThe Axcelis NV GSD VHE is a high-energy ion implantation system designed for deep doping processes in semiconductor manufacturing.
The Axcelis NV GSD 200 E 2 Ion is an ion implanter for 8 inch wafers.
The Axcelis 200 MCU is an 8-inch asher.