Axcelis
Optima HD
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedIon implanters are a class of semiconductor fabrication equipment used to introduce dopant ions into a silicon substrate. In this class of machine, the substrate is placed in a vacuum chamber and exposed to an ion beam of a chosen species. The Optima HD is designed for high current ion implantation processes.
How it works
The Optima HD Imax is designed to support large molecular species such as octadecaborane (B18H22). Machine design improvements were made to support the use of this molecular species. Beam current improvements were accomplished primarily through refinement of the ion beam optics. Other techniques for increasing productivity include improvements in beam utilization and overall operational improvements.[3]
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a doping step used in semiconductor front-end processing. Doping steps are used to create or tune electrically active regions in a device. Implant steps typically occur before later thermal steps that activate the dopants and before film deposition or metallization steps that follow in the process flow.
What do the numbers mean?
Power & electrical5
- 50/60 Hz[1]
Configuration & options3
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does an ion implantation system do?General reference — not yet source-verified
It introduces selected ions into a substrate at controlled energy and dose so the material's electrical characteristics can be changed in a targeted way.
Why is vacuum used in this class of machine?General reference — not yet source-verified
Vacuum conditions help the ion beam travel with minimal scattering and allow the beam to be controlled accurately from source to substrate.
What process variables matter most?General reference — not yet source-verified
The main variables are ion species, beam energy, total dose, and the angle at which the beam reaches the substrate.
Where does ion implantation fit in semiconductor fabrication?General reference — not yet source-verified
It is a doping step used in front-end processing to create or tune electrically active regions before later thermal or film-related steps.
What kinds of structures are made with this class of tool?General reference — not yet source-verified
It is used to form doped device regions and other near-surface profiles that define the electrical behavior of semiconductor structures.
Not publicly documented
The following facts about the Optima HD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Optima HD are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Optima HD are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Optima HD are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Optima HD are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Optima HD is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.comwaferpedia.com
- [3]Beam Current Improvements on the Axcelis Optima HD Imax Implanter (Journal Article) | OSTI.GOV — osti.govosti.gov
Last updated Oct 13, 2026.
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