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Varian

350D

DiscontinuedIon ImplantationIntroduced Produced 1986–Varian 350D family
Research Quality: 20% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Varian 350D is a medium current ion implanter used for doping semiconductor wafers. The Varian 350D can implant boron (B11 or BF2) and phosphorus (P31) into 4-inch or 6-inch wafers. The Varian 350D has an implant energy range of 10 keV to 200 keV and a dose range of 1E12 to 5E15 ions/cm².[1][2]

Varian350D
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What is it?

The Varian 350D is identified as an industry-standard medium current implanter and the predecessor platform from which the 300 XP evolved. The source states that it was the tool of choice during the early 1980s.

What do the numbers mean?

Wafer handling2

Wafer sizes
4 inch and 6 inch[2]
Accurate?
Wafer handling
Vertical, edge-only wafer handling[1]
Accurate?

Configuration & options8

Type
medium current implanter[1]
Accurate?
Relationship to 300 XP
industry-standard predecessor platform that the 300 XP evolved from[1]
Accurate?
Usage period
tool of choice during the early 1980s[1]
Accurate?
Type
Medium current ion implanter[1]
Accurate?
Implant species
Boron (B11 or BF2) and Phosphorus (P31)[2]
Accurate?
Energy range
10 keV to 200 keV[2]
Accurate?
Dose range
1E12 to 5E15 ions/cm²[2]
Accurate?
End stations
Independent dual end stations[1]
Accurate?

Vintage & configurations

  1. 1986Production start[1]

    The 300 XP was introduced in 1986 and evolved from the Varian 350D.

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Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the 350D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented variants, configuration options, or revision breakpoints of the 350D are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 350D are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 350D are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 350D is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 350D are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.orgweb.archive.org
  2. [2]yumpu.comyumpu.comyumpu.com
  3. [3]Varian 350D Ion Implanter User Manual | ManualLib - Manual Librarymanuallib.commanuallib.com
  4. [4]Varian 350D Implanter - Semiconductor Nanofabrication Laboratory - Confluencerit-its.atlassian.netrit-its.atlassian.net
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Last updated Aug 14, 2026.

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