CEE
The CEE 450 Spin is a spin coater. The CEE 450 Spin handles up to 450mm round or 14" x 14" square substrates. The CEE 450 Spin uses internal OS software.[1][2]

A spin coater sits near the beginning of a coating sequence after substrate preparation and before downstream thermal, lithographic, or pattern transfer steps. A spin coating step is commonly followed by bake, exposure, development, curing, or etch, depending on the material and process intent.
The CEE 450 Spin is used for coating substrates in semiconductor and advanced materials work. The CEE 450 Spin is suited to round wafers, square substrates, and other large or unusual substrate geometries within its handling range.[2]
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The following facts about the 450 Spin are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 450 Spin are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 450 Spin are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 450 Spin are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 450 Spin are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 450 Spin is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 19, 2026.
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