CHA
Solution E-Beam
The CHA Solution E-Beam Evaporator is a small-scale vacuum deposition system designed for small lot processing and engineered to handle a wide range of deposition needs. The CHA Solution E-Beam Evaporator performs electron beam (E-Beam) thin metal film evaporation from up to 4 independent sources. The CHA Solution E-Beam Evaporator features a fully water cooled stainless steel chamber and a SmartSource electron beam gun.[1][2]
How it works
The CHA Solution uses a fully water-cooled stainless steel chamber. The CHA Solution includes a SmartSource electron beam gun with motor-driven crucible rotation and a lift lid. The CHA Solution uses neodymium magnets in the SmartSource gun. The CHA Solution has an interlocking crucible cover intended to reduce cross-contamination between source pockets during evaporation. The CHA Solution is monitored and controlled with PLC automation and a touchscreen interface. The CHA Solution can operate in manual or automatic modes. The CHA Solution integrates a Maxtek rate and thickness deposition controller for control of the shutter and the electron beam power supply.[1][4]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Glassman power supply PS/LQ10N1.00GB4 has an issue
What do the numbers mean?
Power & electrical10
Wafer handling3
- Substrate holder
- Dome for holding 2 inch and/or 3 inch back loaded substrates positioned 90 degrees to the source; Dome for two 6 x 6 inch square back loaded substrates positioned 90 degrees to the source[1]
- Substrate holders
- 2 inch and/or 3 inch back loaded substrates; two 6 x 6 inch square back loaded substrates; chip holders for substrate pieces[1]
Optics & imaging2
- Electron beam gun
- SmartSource electron beam gun with motor driven crucible rotation and lift lid[1]
Control & software3
- Automation
- PLC automation with touchscreen interface; manual or automatic operational modes[1]
Configuration & options14
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Voltage220 VAC[3]
- Phase3 Phase[3]
- Frequency60 Hz[3]
- Configuration100 Amps[3]
- ConfigurationGlassman power supply PS/LQ10N1.00GB4 has an issue[3]
- Deposition controllerMaxtek rate and thickness deposition controller integrated for control of shutter and electron beam power supply[1]
- Electrical requirements220 VAC, 3 Phase, 60 Hz, 5 Wire, 100 Amps[3]
- Power supplyGlassman PS/LQ10N1.00GB4 (noted issue)[3]
- Power requirements220 VAC, 3 phase, 60 Hz, 5 wire, 100 amps[3]
- Power supplyGlassman power supply PS/LQ10N1.00GB4[3]
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- EVAP1_operating _procedure_r5.pdfDocumentduke.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of tool is the CHA Solution E-Beam?
The CHA Solution E-Beam is an electron-beam evaporator used for physical vapor deposition.[5][2][1][4]
Not publicly documented
The following facts about the Solution E-Beam are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Solution E-Beam are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Solution E-Beam are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Solution E-Beam are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Solution E-Beam is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Solution E-Beam are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]smif.pratt.duke.edu — smif.pratt.duke.edusmif.pratt.duke.edu
- [2]Physical Vapor Deposition — nanolab.berkeley.edunanolab.berkeley.edu
- [3]Inventory photo
- [4]nanolab.ucla.edu — nanolab.ucla.edunanolab.ucla.edu
- [5]tudelft.nl — tudelft.nltudelft.nl
Last updated Oct 15, 2026.
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