CHA

The CHA 50 S is an e-beam evaporator deposition system that includes a 5-pocket configuration, a Temescal CV 8 scan/beam controller, a Maxtech MDC 360 deposition monitor, and CTI 8-inch cryopumps with helium recharge units.

The CHA SSC-1000 is a multi-station sputtering system configured with up to four RF or DC cathodes.

CHA SEC-1000 is a sputtering system described as a 10-inch system.

The CHA SSC-600 is a sputtering system described as a 6-inch system that supports sputter up or sputter down operation.

CHA SE-1000 is a sputtering system described as a 10-inch system.

The CHA Mark 40 is an e-beam evaporator used for physical vapor deposition (PVD).

The JEOL JBX-9500FS Electron Beam Lithography System can load substrates from 10 mm pieces to 300 mm wafers and write features less than 10 nm in size.

The CHA Mark 50 Vacuum Evaporator is a vacuum evaporator with 3 phase, 208 VAC, 60 Hz, and 175 amps specified.

The CHA Mark 40 SR 10 E-Beam is an e-beam evaporator with a 6-inch wafer size.

The CHA VE 7710 is a thermal evaporator.

CHA LN2 is a cold-weld pinch-off accessory described as an LN2 trap purge/siphon tool with heater.

The CHA Mark-40 is a vacuum evaporation system described as combining features of the Mark 50 system with a broad array of options.

The CHA IG-100 is an ion gauge series used for pressure measurements within a chamber.

The CHA Mark 40 CV RH-PC/PLC is a vacuum evaporator.

The CHA Mark 40 C is an evaporator with a listed process chamber size of 26" x 26".

The CHA 1000 is a 5-inch evaporator system with a 6-pocket E-gun, SR 10 power supply, and tri dome system.

The CHA Solution E-Beam Evaporator is an E-beam evaporator with a listed Glassman power supply.

The CHA SE 600 High Vacuum E-Beam Evaporation System is a deposition tool configured for 3 in. diameter wafers.