Edwards
The Edwards EB1 is a magnetically focused electron beam source. The Edwards EB1 is ultra-compact. The Edwards EB1 is powered by an EB3 5 kV 600 mA constant voltage power supply.[1][2]

The Edwards EB1 is a magnetically focused electron beam source for thin film deposition. The Edwards EB1 is ultra-compact and is supplied mounted on an integral dual water feedthrough. The Edwards EB1 uses a 1 cm3 copper hearth. The Edwards EB1 can be fitted in multiple-source arrangements for multi-layer depositions.[1]
The Edwards EB1 has a standard hearth formed as a water-cooled copper block with a conically shaped aperture that accepts a removable copper crucible. The Edwards EB1 can also take refractory crucible liners for evaporating materials such as aluminum and copper. The Edwards EB1 has a variable power rating up to 3.0 kVA. The Edwards EB1 achieves 180 beam deflection by a permanent magnet made from Trigonal G. The Edwards EB1 is powered by the EB3 5 kV 600 mA constant voltage power supply. The Edwards EB1 is supplied complete with two high vacuum feedthroughs.[1]
Electron beam evaporation tools sit in the thin film formation portion of a process flow. Electron beam sources are used after substrate preparation and before later steps that may include pattern transfer, lift-off, annealing, inspection, or additional film deposition. In research and specialty production environments, electron beam deposition is commonly integrated where a vacuum-deposited metal or compound layer is needed on a prepared substrate.
The Edwards EB1 is intended for high rate, thick film depositions. The Edwards EB1 can be used in multiple-source arrangements for multi-layer depositions. The Edwards EB1 can use refractory crucible liners for evaporating aluminum and copper.[1]
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The Edwards EB1 is a magnetically focused electron beam source for thin film deposition.[1]
The Edwards EB1 uses a 1 cm3 copper hearth.[1]
The Edwards EB1 is powered by the EB3 5 kV 600 mA constant voltage power supply.[1]
The Edwards EB1 can be fitted in multiple-source arrangements for multi-layer depositions.[1]
The following facts about the EB1 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EB1 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EB1 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EB1 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EB1 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EB1 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 15, 2026.