Waferpedia

Edwards

EB1

electron beam sourceEdwards EB1 family
Research Quality: 60% complete
Email

The Edwards EB1 is a magnetically focused electron beam source. The Edwards EB1 is ultra-compact. The Edwards EB1 is powered by an EB3 5 kV 600 mA constant voltage power supply.[1][2]

EB1 — web.archive.org
Fig. 01EB1web.archive.org[1]

What it is

The Edwards EB1 is a magnetically focused electron beam source for thin film deposition. The Edwards EB1 is ultra-compact and is supplied mounted on an integral dual water feedthrough. The Edwards EB1 uses a 1 cm3 copper hearth. The Edwards EB1 can be fitted in multiple-source arrangements for multi-layer depositions.[1]

How it works

The Edwards EB1 has a standard hearth formed as a water-cooled copper block with a conically shaped aperture that accepts a removable copper crucible. The Edwards EB1 can also take refractory crucible liners for evaporating materials such as aluminum and copper. The Edwards EB1 has a variable power rating up to 3.0 kVA. The Edwards EB1 achieves 180 beam deflection by a permanent magnet made from Trigonal G. The Edwards EB1 is powered by the EB3 5 kV 600 mA constant voltage power supply. The Edwards EB1 is supplied complete with two high vacuum feedthroughs.[1]

Where it fits in the process flow

General reference — not yet source-verified

Electron beam evaporation tools sit in the thin film formation portion of a process flow. Electron beam sources are used after substrate preparation and before later steps that may include pattern transfer, lift-off, annealing, inspection, or additional film deposition. In research and specialty production environments, electron beam deposition is commonly integrated where a vacuum-deposited metal or compound layer is needed on a prepared substrate.

Applications

The Edwards EB1 is intended for high rate, thick film depositions. The Edwards EB1 can be used in multiple-source arrangements for multi-layer depositions. The Edwards EB1 can use refractory crucible liners for evaporating aluminum and copper.[1]

  • thin film deposition
  • high rate, thick film depositions
  • multi-layer depositions
  • evaporating aluminum and copper

What do the numbers mean?

Power & electrical1

power supply
EB3 5 kV 600 mA constant voltage power supply[1]
Accurate?

Vacuum & pumping1

feedthroughs
supplied complete with two high vacuum feedthroughs[1]
Accurate?

Optics & imaging1

type
magnetically focused electron beam source[1]
Accurate?

Configuration & options11

compactness
ultra-compact[1]
Accurate?
mounting
supplied mounted on an integral dual water feedthrough[1]
Accurate?
hearth volume
1 cm3 copper hearth[1]
Accurate?
deposition capability
high rate, thick film depositions[1]
Accurate?
multi-source capability
multiple sources can be fitted for multi-layer depositions[1]
Accurate?
standard hearth
water-cooled copper block with a conically shaped aperture to accept a removable copper crucible[1]
Accurate?
crucible liners
refractory crucible liners can be fitted for evaporating aluminum and copper[1]
Accurate?
power rating
variable up to 3.0 kVA[1]
Accurate?
beam deflection
180°[1]
Accurate?
beam deflection magnet
permanent magnet manufactured from Trigonal G[1]
Accurate?
magnet characteristics
selected for low outgassing characteristics and field stability at high temperatures[1]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • power supplyEB3 5 kV 600 mA constant voltage power supply[1]
  • feedthroughssupplied complete with two high vacuum feedthroughs[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What type of equipment is the Edwards EB1?

The Edwards EB1 is a magnetically focused electron beam source for thin film deposition.[1]

What hearth does the Edwards EB1 use?

The Edwards EB1 uses a 1 cm3 copper hearth.[1]

What power supply is used with the Edwards EB1?

The Edwards EB1 is powered by the EB3 5 kV 600 mA constant voltage power supply.[1]

Can the Edwards EB1 support multilayer deposition setups?

The Edwards EB1 can be fitted in multiple-source arrangements for multi-layer depositions.[1]

Not publicly documented

The following facts about the EB1 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EB1 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EB1 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EB1 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EB1 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EB1 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]EB1 — Edwards | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Was this page accurate?

Last updated Oct 15, 2026.

Compare with similar tools

View all →