FormFactor
Alessi REL 4800
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
What do the numbers mean?
Wafer handling1
Configuration & options7
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kinds of measurements are typically performed on a probe station?General reference — not yet source-verified
Such systems are used for a broad range of electrical measurements, including basic continuity and leakage checks as well as more detailed characterization of device response under applied signals. The exact measurement depends on the connected instrumentation and the structure under test.
Why are alignment and contact control important in this equipment class?General reference — not yet source-verified
Electrical pads and test structures can be small and sensitive, so the probe must land accurately and consistently to obtain valid data without damaging the surface. Stable positioning and controlled contact are central to measurement repeatability.
Not publicly documented
The following facts about the Alessi REL 4800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alessi REL 4800 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alessi REL 4800 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alessi REL 4800 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alessi REL 4800 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alessi REL 4800 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
Last updated Oct 19, 2026.
Compare with similar tools
View all →The Tenney TPS JR-A-F4T is a junior compact temperature test chamber with a 1.2 cubic foot chamber size and a temperature range of -68°C to +180°C.
The Rorze 03 RR 8120-001-001 is a wafer exchanger for 8-inch wafers.
The KLA 1007 is a wafer prober manufactured by KLA.