Waferpedia

Hitachi

S4600

MeasurementHitachi S4600 family
Research Quality: 40% complete
LinkedIn X Email
S4600 — Inventory photo
Fig. 01S4600Inventory photo[2]

What is it?

The source identifies the equipment as a Hitachi S4600 SEM and describes the Hitachi S-4700 FE-SEM as a cold field emission high-resolution scanning electron microscope. It is described as suitable for ultra-high-resolution imaging of thin films, semiconductor materials on exceptionally clean specimens, and polymeric materials. The system is configured for secondary and backscattered electron detection as well as characteristic X-rays, and it includes menu-driven Windows software, automation, and energy-dispersive analysis capabilities.

What can it run?

Process applications and technology nodes documented for this tool.

  • ultra high resolution imaging of thin films
  • imaging semiconductor materials
  • imaging polymeric materials
  • secondary imaging
  • backscatter imaging
  • X-ray mapping
  • qualitative analysis
  • quantitative analysis

What do the numbers mean?

Power & electrical1

Backscatter imaging capability
possible at accelerating voltages as low as 1 kV at high resolution[1]
Accurate?

Optics & imaging1

Instrument type
cold field emission high resolution scanning electron microscope[1]
Accurate?

Control & software2

Control software
menu driven software[1]
Accurate?
Operating system
Windows software[1]
Accurate?

Configuration & options4

Equipment name
Hitachi S4600 SEM[1]
Accurate?
Configured detections
secondary and backscattered electrons and characteristic X-rays[1]
Accurate?
Analysis capability
energy dispersive analysis[1]
Accurate?
Element range
boron through uranium[1]
Accurate?

Vintage & configurations

Control-system eraWindows[1]

Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Backscatter imaging capabilitypossible at accelerating voltages as low as 1 kV at high resolution[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the S4600 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S4600 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the S4600 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • No publicly documented failure modes or field errata for the S4600 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the S4600 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the S4600 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]nanolab.ucla.edu — nanolab.ucla.edunanolab.ucla.edu
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Inventory photo
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →
UNECS-2000Ulvac

The ULVAC UNECS-2000 is a spectroscopic ellipsometer used to measure refractive index and thin-film thickness.

CategoryMeasurement
8 specs
S4600 vs UNECS-2000 →