Nikon
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The Nikon 204 B is a lithography scanner.[1]
A lithography scanner transfers a patterned image from a mask or reticle onto a photoresist-coated substrate by controlled optical exposure and alignment.
A scanner in this class typically aligns the mask pattern to the wafer, exposes selected fields, and repeats the exposure sequence across the substrate.
A lithography scanner sits in the patterning portion of semiconductor fabrication.
A lithography scanner follows resist preparation and alignment steps and precedes resist development and subsequent pattern-transfer steps.
A lithography scanner is used to define circuit patterns on semiconductor wafers.
A lithography scanner is used wherever repeated optical pattern transfer is needed in microfabrication.
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The following facts about the 204 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the 204 B are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 204 B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 204 B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 204 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 204 B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Oct 3, 2026.
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