Nikon
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In a stepper, the wafer is exposed field by field through optical projection. The machine illuminates a reticle, images the pattern through reduction optics, and exposes selected areas of the wafer in repeated steps to build the circuit layer.
An i-line stepper uses near-ultraviolet i-line illumination, which is used for optical lithography on mature process nodes and for layers that do not require the smallest feature sizes.
This type of equipment sits after wafer preparation and photoresist coating and before development and subsequent etch or implantation steps. It defines the geometric pattern for a wafer layer.
Lithography tools of this class are used repeatedly across a fabrication flow, with alignment and exposure performed for each patterned layer.
i-line steppers are used for patterning semiconductor device layers where optical lithography at near-ultraviolet wavelength is appropriate, including many mature-node integrated-circuit processes.
They are also used for general wafer-level microfabrication tasks that rely on repeated optical transfer of circuit or device patterns from a mask to the substrate.
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The Nikon NSR 2005 i 8 A is an i-line stepper for semiconductor lithography.[1]
The following facts about the NSR 2005 i 8 A i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the NSR 2005 i 8 A i-Line are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR 2005 i 8 A i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR 2005 i 8 A i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR 2005 i 8 A i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR 2005 i 8 A i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Jul 29, 2026.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.