Nikon
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The Nikon NSR 2005 i 9 is an i-line stepper used for lithography.[1]
i-line lithography uses a specific ultraviolet emission of a mercury arc lamp. The photoresist is selectively changed by the exposure, forming a latent image that is developed after exposure.
Steppers of this class typically include an alignment system that overlays each exposure field with previously patterned layers on the wafer.
Lithography is the patterning step in the front end of semiconductor fabrication. Before exposure, a wafer is coated with photoresist; after exposure, the wafer is developed, etched, and stripped of residual resist.
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The following facts about the NSR 2005 i 9 i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR 2005 i 9 i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR 2005 i 9 i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR 2005 i 9 i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR 2005 i 9 i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR 2005 i 9 i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Aug 14, 2026.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.