Nikon

| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| NSR S 207 D with Cymer laser | — | 2005 | Listed as a Nikon NSR S 207 D stepper with Cymer laser. | Equipment inventory listing[1] |
| NSR S 207 D with Gigaphoton laser | — | 2005 | Listed as a Nikon NSR S 207 D stepper with Gigaphoton laser. | Equipment inventory listing[2] |
| NSR S 207 D with G41K2 Gigaphoton laser | — | 2004 | Listed as a Nikon NSR S 207 D stepper with G41K2 Gigaphoton laser. | Equipment inventory listing[3] |
| NSR S 207 D machine only | — | — | Listed as the Nikon NSR S 207 D stepper machine only. | Equipment inventory listing[4] |
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The following facts about the NSR S 207 D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR S 207 D are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the NSR S 207 D are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR S 207 D are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR S 207 D is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR S 207 D are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Jul 29, 2026.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.