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Tool family

Nikon NSR

NikonLithography15 entries
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Models in this family

  1. The Nikon NSR 1505 G 6 E is a 6-inch stepper described as a 0.65um G-line system.

  2. The Nikon NSR 4425 i i-Line is an i-line stepper for lithography designed for 8-inch wafers with a resolution of 0.35 µm.

  3. The Nikon NSR i 14 E is an i-line stepper.

  4. The Nikon NSR S 205 C is a scanner with 12-inch wafer size support and 248nm KrF exposure.

  5. The Nikon NSR S 207 D is a stepper lithography tool. The listed examples include configurations with a Cymer laser, a Gigaphoton laser, or a G41K2 Gigaphoton laser.

    Cited variants

    DesignationGenerationVintageChangesSource
    NSR S 207 D with Cymer laser—2005Listed as a Nikon NSR S 207 D stepper with Cymer laser.Equipment inventory listing[1]
    NSR S 207 D with Gigaphoton laser—2005Listed as a Nikon NSR S 207 D stepper with Gigaphoton laser.Equipment inventory listing[2]
    NSR S 207 D with G41K2 Gigaphoton laser—2004Listed as a Nikon NSR S 207 D stepper with G41K2 Gigaphoton laser.Equipment inventory listing[3]
    NSR S 207 D machine only——Listed as the Nikon NSR S 207 D stepper machine only.Equipment inventory listing[4]
    Nikon NSR S 207 D with Cymer laser—2005–2005Configured with a Cymer laser.Equipment inventory listing[1]
    Nikon NSR S 207 D with Gigaphoton laser—2005–2005Configured with a Gigaphoton laser.Equipment inventory listing[2]
    Nikon NSR S 207 D with Gigaphoton laser (second unit)—2005–2005Configured with a Gigaphoton laser.Equipment inventory listing[5]
    Nikon NSR S 207 D with G41K2 Gigaphoton laser—2004–2004Configured with a G41K2 Gigaphoton laser.Equipment inventory listing[3]
  6. The Nikon NSR S 210 D is a lithography system used for photolithographic patterning in semiconductor manufacturing, belonging to the class of projection aligners that transfer circuit patterns from a reticle onto a photosensitive-coated substrate.

  7. The Nikon NSR S 307 E is a deep UV lithography scanner that operates at a wavelength of 193 nm using an ArF excimer laser.

  8. The Nikon NSR-SF100 is an i-line scan field stepper that achieves resolutions of 0.4 microns or smaller with a 1:4 reduction ratio on an exposure field of 25 x 33 mm.

  9. The Nikon NSR SF 140 i-Line is a stepper used for semiconductor lithography.

    Cited variants

    DesignationGenerationVintageChangesSource
    With HDD——Configuration option listed as with HDD.waferpedia.com[6]
  10. The Nikon NSR SF 155 is an i-line stepper with a 12-inch wafer size.

  11. The Nikon NSR SF 200 is a semiconductor equipment tool identified with a 6-inch wafer size.

All entries

  1. NSR 1505 G 6 ENikon

    The Nikon NSR 1505 G 6 E is a 6-inch stepper described as a 0.65um G-line system.

    CategoryLithography
    7 specs
  2. NSR 4425 i i-LineNikon

    The Nikon NSR 4425 i i-Line is an i-line stepper for lithography designed for 8-inch wafers with a resolution of 0.35 µm.

    CategoryLithography
    5 specs
  3. NSR i 11 C i-LineNikon
    CategoryLithography
    5 specs
  4. NSR i 14 E i-LineNikon

    The Nikon NSR i 14 E is an i-line stepper.

    CategoryLithography
    4 specs
  5. NSR S 205 CNikon

    The Nikon NSR S 205 C is a scanner with 12-inch wafer size support and 248nm KrF exposure.

    CategoryLithography
    20 specs
  6. NSR S 207 DNikon

    The Nikon NSR S 207 D is a stepper lithography tool. The listed examples include configurations with a Cymer laser, a Gigaphoton laser, or a G41K2 Gigaphoton laser.

    CategoryLithography
    17 specs
  7. NSR S 210 DNikon

    General referenceThe Nikon NSR S 210 D is a lithography system used for photolithographic patterning in semiconductor manufacturing, belonging to the class of projection aligners that transfer circuit patterns from a reticle onto a photosensitive-coated substrate.

    CategoryLithography
    4 specs
  8. NSR S 306 ENikon
    CategoryLithography
    6 specs
  9. NSR S 307 ENikon

    The Nikon NSR S 307 E is a deep UV lithography scanner that operates at a wavelength of 193 nm using an ArF excimer laser.

    CategoryLithographyWaferWafer X-Axis is out of order
    18 specs
  10. NSR S 609 B ArF ImmersionNikon
    CategoryLithography
    1 spec
  11. NSR SF 100 i-LineNikon

    The Nikon NSR-SF100 is an i-line scan field stepper that achieves resolutions of 0.4 microns or smaller with a 1:4 reduction ratio on an exposure field of 25 x 33 mm.

    CategoryLithography
    16 specs
  12. NSR SF 140 i-LineNikon

    The Nikon NSR SF 140 i-Line is a stepper used for semiconductor lithography.

    CategoryLithography
    6 specs
  13. NSR SF 155 i-LineNikon

    The Nikon NSR SF 155 is an i-line stepper with a 12-inch wafer size.

    CategoryLithography
    30 specs
  14. NSR SF 200Nikon

    The Nikon NSR SF 200 is a semiconductor equipment tool identified with a 6-inch wafer size.

    29 specs
  15. NSR TFH i 14 DL i-LineNikon
    CategoryLithography
    15 specs

Sources

Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing
  6. [6]waferpedia.comwaferpedia.com