Nikon
NSR S 208 D KrF
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Nikon NSR S 208 D is a KrF scanning system operating at 248 nm. The Nikon NSR S 208 D is targeted for volume production of 110 nm devices and sub-critical 90 nm layers. The Nikon NSR S 208 D features an NA of 0.82, a 4x reduction, and accommodates 200 mm and 300 mm wafers.[1]
What it is
General reference — not yet source-verifiedLithography scanners transfer circuit patterns from a reticle onto photoresist-coated wafers. Lithography scanners are core patterning tools in semiconductor manufacturing. KrF scanners belong to the deep ultraviolet generation of optical lithography tools and are used where the required pattern dimensions fit the capability of that exposure wavelength and optical system.
How it works
Where it fits in the process flow
General reference — not yet source-verifiedLithography scanners operate after wafer coating with photoresist and related bake steps, and before resist development and pattern transfer. Lithography exposure sits at the center of repeated patterning loops used to define device features across many process layers. Scanner output is typically followed by etch or by deposition and lift-off flows, depending on the process module being built.
Applications
The Nikon NSR S 208 D is targeted for volume production of 110 nm devices and sub-critical 90 nm layers.[1]
What do the numbers mean?
Vintage & configurations
- 2004Introduction[1]
The NSR-S208D was introduced in 2004.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What device generation is the Nikon NSR S 208 D targeted for?
The Nikon NSR S 208 D is targeted for volume production of 110 nm devices and sub-critical 90 nm layers.[1]
What exposure and optical parameters are given for the Nikon NSR S 208 D?
The Nikon NSR S 208 D is specified at 248 nm exposure, 0.82 numerical aperture, 4x reduction, and a 26 x 33 mm exposure field.[1]
When was the Nikon NSR S 208 D introduced?
The Nikon NSR S 208 D has an introduction date of 2004.[1]
Not publicly documented
The following facts about the NSR S 208 D KrF are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the NSR S 208 D KrF are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR S 208 D KrF are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR S 208 D KrF are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR S 208 D KrF is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR S 208 D KrF are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]web.archive.org — nikonprecision.com (Jun 23, 2006)web.archive.org
- [2]Inventory photo
- [3]inventory listing
- [4]Equipment inventory listing
Last updated Oct 17, 2026.
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