Nikon
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The Nikon Optiphot 200 / NWL 851 is a microscope used for metrology and inspection in semiconductor work.[1]
A microscope of this class uses an optical imaging path to inspect features on a wafer surface and support measurement-oriented review. In semiconductor use, this kind of instrument is positioned so an operator can view patterns, edges, and defects at magnification and evaluate surface condition directly.
This class of equipment is typically used after process steps that create or modify patterns, when a wafer must be checked for alignment, pattern fidelity, or visible defects before the next operation.
Equipment of this type is used for wafer inspection and metrology tasks in semiconductor manufacturing.
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The make is Nikon and the model is Optiphot 200 / NWL 851.[1]
The following facts about the Optiphot 200 NWL 851 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the Optiphot 200 NWL 851 are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Optiphot 200 NWL 851 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Optiphot 200 NWL 851 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Optiphot 200 NWL 851 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Optiphot 200 NWL 851 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Jul 30, 2026.
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