Oxford Instruments
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The Oxford 100 Plus Nitride is a nitride deposition system. The Oxford 100 Plus Nitride is made by Oxford.[1]
The Oxford 100 Plus Nitride Deposition is a deposition system for nitride films. The make is Oxford.[1]
Nitride films deposited by such systems are used as gate dielectrics in certain transistors, as sidewall spacers, as diffusion barriers, and as antireflection coatings in photolithography.
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The following facts about the 100 Plus Nitride are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 100 Plus Nitride are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 100 Plus Nitride are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 100 Plus Nitride are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 100 Plus Nitride are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 100 Plus Nitride is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Aug 13, 2026.
The Oxford 100 Nitride is a deposition system manufactured by Oxford Instruments for depositing nitride layers.