Pfeiffer
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The Pfeiffer Alcatel 2460 is a physical vapor deposition sputter system for 6-inch wafers.[2][1]
The Alcatel 2460 is used before downstream steps that depend on a deposited film, and its chamber is returned to production after cleaning.[3]
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Deposition is usually performed after surface preparation and before later structuring or finishing steps, although it can also be repeated at multiple stages in a multilayer flow.
Process control is important because film uniformity, composition, and interface quality depend on stable chamber conditions and consistent material delivery.
The following facts about the Alcatel 2460 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alcatel 2460 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alcatel 2460 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alcatel 2460 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alcatel 2460 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alcatel 2460 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 13, 2026.
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