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Pfeiffer

Alcatel 2460

DepositionPfeiffer Alcatel family
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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

PfeifferAlcatel 2460
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What it is

The Pfeiffer Alcatel 2460 is a physical vapor deposition sputter system for 6-inch wafers.[2][1]

How it works

The Alcatel 2460 is a process chamber-based tool, and its chamber accumulates process residue during use.[3]

The Alcatel 2460 process chamber is cleaned with wet-wipe and scrub steps to remove deposition and particle defects from chamber surfaces.[3]

Where it fits in the process flow

The Alcatel 2460 is used before downstream steps that depend on a deposited film, and its chamber is returned to production after cleaning.[3]

Applications

The Alcatel 2460 is used for sputter deposition on 6-inch wafers.[2][1]

What do the numbers mean?

Power & electrical4

Phase
3 Phase[1]
Accurate?
50/60 Hz[1]
Accurate?
Voltage
208V[1]
Accurate?
Frequency
50/60 Hz[1]
Accurate?

Wafer handling1

Wafer size
6 inch[1]
Accurate?

Configuration & options5

Category
Deposition[2]
Accurate?
Process type
PVD sputter physical vapor deposition system[2]
Accurate?
Vintage
1997[1]
Accurate?
OEM
Pfeiffer / Alcatel[1]
Accurate?
Model
2460[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Phase3 Phase[1]
  • Configuration50/60 Hz[1]
  • Voltage208V[1]
  • Frequency50/60 Hz[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

Where does deposition fit in a fabrication sequence?General reference — not yet source-verified

Deposition is usually performed after surface preparation and before later structuring or finishing steps, although it can also be repeated at multiple stages in a multilayer flow.

Why is process control important in deposition?General reference — not yet source-verified

Process control is important because film uniformity, composition, and interface quality depend on stable chamber conditions and consistent material delivery.

Not publicly documented

The following facts about the Alcatel 2460 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alcatel 2460 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Alcatel 2460 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Alcatel 2460 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Alcatel 2460 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Alcatel 2460 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]https://www.foamtecintlwcc.com/wp-content/uploads/2023/02/alcatel-2460-process-chamber.pdf — foamtecintlwcc.comfoamtecintlwcc.com
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Last updated Oct 13, 2026.

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