6 DE 2

The Strasbaugh 6 DE 2 is a polisher made by Strasbaugh. The Strasbaugh 6 DE 2 has a 2 spindle configuration. The Strasbaugh 6 DE 2 uses 3 phase power. The Strasbaugh 6 DE 2 has a DC controller.^[1][2]

CMP polishers press a wafer against a rotating polishing surface while slurry is delivered to the interface. CMP polishers remove material through the combined effect of surface chemistry, abrasive particles, relative motion, and controlled downforce. CMP polishers typically use spindle motion and platen motion to produce uniform polishing across the wafer surface.

CMP tools are used after deposition and patterning steps when accumulated film topography must be reduced before subsequent processing. CMP tools sit between film formation steps and later lithography, etch, cleaning, and metallization operations that benefit from a flatter wafer surface. CMP is commonly integrated with process flows that require planar surfaces for depth of focus control, interconnect formation, or layer to layer integration.

CMP polishers are applied to planarization of dielectric, metal, and barrier films in semiconductor fabrication. CMP polishers are also used where controlled material removal is needed to improve surface flatness and prepare wafers for additional device layers. CMP methods are relevant to interconnect processing, isolation schemes, and other multilayer structures that accumulate surface height variation during fabrication.