SUSS MicroTec
MA 100 E Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What is it?
What do the numbers mean?
Configuration & options1
- Possibly missing minor parts[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does a mask lithography machine do?General reference — not yet source-verified
It transfers a pattern from a mask into a photosensitive resist layer on a substrate so that the pattern can be developed and used in later fabrication steps.
What kinds of materials does this class process?General reference — not yet source-verified
Machines of this class typically process coated substrates such as semiconductor wafers or other flat workpieces that can carry a photoresist layer.
Where is this class used in manufacturing?General reference — not yet source-verified
It is used in the pattern-definition stage of microfabrication, before the patterned resist is converted into etched, plated, or otherwise modified structures.
Why is alignment important in this class of equipment?General reference — not yet source-verified
Alignment ensures that the mask pattern is placed in the correct position on the substrate so that each exposed feature matches the intended layout.
What kinds of work are suitable for this class of tool?General reference — not yet source-verified
It is suited to applications that rely on photomask-defined features, including device fabrication, process development, and other precision patterning tasks.
Not publicly documented
The following facts about the MA 100 E Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the MA 100 E Mask are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 100 E Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 100 E Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 100 E Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 100 E Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
Last updated Jul 29, 2026.
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