SUSS MicroTec

The SUSS ACS200 GEN3 is a modular cluster tool for coating and development of i-line photoresists.

The SUSS ACS 300 Gen 2 is a coater/developer system.

The SUSS Falcon ACS 200 is a coater/developer cluster system for wafer processing.

The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.

The SUSS MicroTec Delta 12 AQ is an automated photoresist developer station that supports temperature controlled spray photoresist development.

The SUSS MA 150 E Mask Aligner is a 6-inch mask aligner configured with wafer thickness measurement and related alignment accessories.

The SUSS Falcon is a wafer backside rinse developer system configured for 6-inch to 8-inch wafers.

General referenceSUSS MicroTec Mask is a wet processing and cleanroom class machine used for handling masks and related patterning hardware in semiconductor or precision optics manufacturing. It belongs to the class of equipment that supports mask cleaning, inspection, and preparation before use in downstream lithography or related process steps.

The SUSS MicroTec MJB4 is a manual mask/wafer aligner for research and development that aligns and exposes wafers up to 4 inch (100 mm) diameter.

SUSS MicroTec C4NP is a solder transfer and mold-based wafer bumping tool line for C4NP applications.

The SUSS MJB 4 Mask Aligner is a mask aligner used for contact exposure and alignment, with source-stated support for wafers up to 4 inches in diameter.

The SUSS MA 8 / BA 8 Gen 3 Mask Aligner is a mask aligner model from SUSS.

The SUSS P 8 is a manual probe station prober.