SUSS MicroTec
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The SUSS MicroTec MA 150 Mask Aligner is a lithography mask aligner used to transfer patterns from a photomask to a wafer in microfabrication.
A mask aligner brings a photomask and a photoresist-coated wafer into precise relative position so the mask pattern can be exposed onto the wafer. In this class of equipment, alignment is performed optically, and exposure is then used to define the resist pattern for subsequent processing.
A mask aligner is used in the lithography step of wafer fabrication, after a substrate has been prepared with photoresist and before pattern transfer into underlying films or the substrate itself.
The SUSS MA 150 is suitable for six-inch wafer processing in top-side lithography.[1]
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It is a lithography mask aligner.[1]
The following facts about the MA 150 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the MA 150 Mask are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 150 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 150 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 150 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 150 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Jul 29, 2026.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.