SUSS MicroTec
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The MA12 Gen3 is a mask alignment system from SUSS MicroTec's MA12 series, third generation. The MA12 Gen3 is designed for accurate mask alignment to expose complex structures reliably at high yield.[1]

Process applications and technology nodes documented for this tool.
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The MA12 Gen3 is a mask alignment system used for imaging in semiconductor lithography.[1]
The following facts about the MA12 Gen3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA12 Gen3 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA12 Gen3 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA12 Gen3 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA12 Gen3 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA12 Gen3 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 21, 2026.
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