Manufacturer
Tegal
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45 entries
- 901GTegal
The Tegal 901G is a diode plasma etcher specially configured for GaAs processing and used for etching high-performance devices on gallium arsenide substrates.
CategoryEtchWafer75 mm to 150 mm round substrates; square and rectangular substrates - Tegal 903Tegal
The Tegal 903 is an etcher in the Tegal 9XX Series Etchers.
CategoryEtch - 903ACSTegal
The Tegal 903ACS is a narrow gap diode reactor system for semiconductor etching of silicon, Ga-As, In-P, and Si-Ge substrates.
CategoryEtchWafer75 mm, 100 mm, 125 mm, and 150 mm diameter wafers; 4-inch square wafersNode1 micron - 6500 HRe-Tegal
The Tegal 6500 HRe- is a dual-frequency etch system series for plasma etching. The Tegal 6500 HRe- uses high-density, capacitively coupled plasma generation and magnetic plasma confinement for precise etching down to the sub-micron level.
CategoryEtch - Plasmaline 411Tegal
The Tegal Plasmaline 411 is an asher described as a plasma oven and Ar O2 asher etcher.
CategoryResist Processing - 701Tegal
The Tegal 701 is an inline automatic wafer RF plasma etcher.
CategoryEtch - i90XTegal
The Tegal i90X is a plasma etch system based on the production-proven Tegal 900-series platform, with unlimited recipes, 20X fine set-point control, and a Windows NT touchscreen control system.
CategoryEtch - 110Tegal
The Tegal 110 SE is a compact, flexible plasma etch system for process development applications, with deep silicon etching capabilities for MEMS and 3D-IC components.
CategoryEtch - 1511eTegal
The Tegal 1511e is a tri-electrode dual-frequency plasma etch system for processing three- to six-inch wafers.
CategoryEtchWaferthree- to six-inch wafers - 703 RPPSTegal
The Tegal 703 RPPS is a plasma inline etcher. The source listing groups the Tegal Corporation Plasma Inline 703, 703 RPPS, and 701 Etcher together.
CategoryEtch - 3200Tegal
The Tegal 3200 SE is an advanced cluster platform for 3D IC and MEMS applications that can be configured with up to 3 process modules.
Categoryadvanced cluster platformWafer200mm - 4200Tegal
The Tegal 4200 SE is an advanced cluster platform for 3D IC and MEMS applications.
Categorycluster platformWafer200mm - 901Tegal
The Tegal 901 is an etcher for non-critical silicon nitride, photoresist trim, and poly etching.
CategoryEtch - 981ACSTegal
The Tegal 981ACS is a scaled-up version of the 901ACS diode RIE system built for handling 150 mm and 200 mm wafers and large-area etching operations.
CategoryEtchWafer150mm - 421Tegal
The Tegal 421 (Plasmaline 421) is a barrel-type oxygen plasma asher used for photoresist stripping.
CategoryBarrel type photoresist asher - 903 E DryTegal
The Tegal 903 E Dry is a dry etcher designed for 6-inch wafers.
CategoryEtch - 6500Tegal
The Tegal 6500 is a 2-chamber nitride etch system.
CategoryEtch - Tegal 9XXTegal
The Tegal 9XX is a series of etchers.
CategoryEtch - 901ACSTegal
The Tegal 901ACS is a wide-gap diode reactor system for plasma etch operations on semiconductor substrates and wafers.
CategoryEtchWafer75 mm, 100 mm, 125 mm, and 150 mm diameter wafers; 4-inch square wafersNode1 micron - T915Tegal
The Tegal T915 is a resist asher (asher) for semiconductor wafer processing.
CategoryResist Processing - 703Tegal
The Tegal 703 is a plasma inline etcher mentioned in equipment and parts listings.
CategoryEtch - 9XXTegal
The Tegal 9XX is a series of etchers that includes the Tegal 901, Tegal 903, and Tegal 915 models.
CategoryEtch - 200Tegal
The Tegal 200 SE is a DRIE system described as suited for 3D-SiP and MEMS volume manufacturing.
CategoryDRIE - 6500 UTegal
The Tegal 6500 U is a 2-chamber nitride etcher.
CategoryEtch - 980Tegal
Tegal 980 ACS is a plasma etch system series described as serving the 200mm fab line.
CategoryEtchWafer200mm - 415 RFGTegal
The Tegal 415 RFG is a plasma asher introduced in 1981.
- 803Tegal
The Tegal 803 is an inline automatic wafer RF plasma etcher.
CategoryEtch - 1512eTegal
The Tegal 1512e is an industrial RIE plasma etcher system with modules assembly for CI-4222.
CategoryEtch - PLASMALINE MODEL 421Tegal
The Tegal PLASMALINE MODEL 421 is a plasma etcher/asher.
CategoryEtch - 6550Tegal
The Tegal 6550 is a plasma etch reactor/system for etching non-volatile metal and metal oxide films, with a dual-chamber platform and patented rinse-strip-rinse capability.
CategoryEtchWafer100mm - 900Tegal
The Tegal 900 is a plasma etch system used for applications including defreckling, backside nitride etching, and processing III-V materials.
CategoryEtchWafer100mm - 903Tegal
The Tegal 903 ACS is a diode plasma etch tool for semiconductor processing with a wafer size range of 3 inches, 100 mm to 150 mm.
CategoryEtchWafer100mm - 915Tegal
The Tegal 915 is a plasma barrel etcher with batch capacity for 100 mm, 125 mm, and 150 mm wafers.
CategoryEtchWafer100mm - 6510Tegal
The Tegal 6510 is a high-density CCP plasma etch tool with dual-frequency RF power application and magnetic plasma confinement.
CategoryEtchWafer100mmNodedown to 90nm - 6520Tegal
The Tegal 6520 is a high-density CCP plasma etch tool with dual-frequency RF power application and magnetic plasma confinement.
CategoryEtchWafer100mm - 6540Tegal
The Tegal 6540 is a high-density plasma etch system used for etching difficult-to-etch materials in MEMS and related semiconductor applications.
CategoryEtchWafer100mmNodedown to 90nm - 901eTegal
The Tegal 901e is a diode plasma etcher used for GaAs and other semiconductor applications, with source-described substrate handling for 75 mm to 150 mm round wafers and some rectangular substrates.
CategoryEtchWafer75 mm to 150 mm round substrates; rectangular substrates from 100 mm to 125 mm on a sideNodedown to 0.5 micron - 903eTegal
The Tegal 903e is a diode plasma etch tool used for applications including oxide etching and other semiconductor and compound-semiconductor etch processes.
CategoryEtchWafer75 mm to 150 mm round substrates; rectangular substrates from 100 mm to 125 mm on a side - 981Tegal
The Tegal 981 is a plasma etch tool for thin film head fabrication, described as achieving precise photoresist descum with 4:1 anisotropy at low processing temperatures in oxygen-free plasmas.
CategoryEtchWafer150mmLegacy - 900ACSTegal
The Tegal 900ACS is a single-wafer cassette-to-cassette non-critical plasma etch system for 75mm to 200mm wafers.
CategoryEtchWafer75mm to 200mm wafersLegacy - T 903 E Plasma RIETegal
The Tegal T 903 E Plasma RIE is a reactive ion etcher in the Etch category.
CategoryEtch - 90 XTegal
General referenceThe Tegal 90 X is an etch system designed for semiconductor fabrication, representing a class of dry plasma etching equipment used to remove material from wafer surfaces with high precision.
CategoryEtch - Tegal 915Tegal
The Tegal 915 is a Tegal 9XX Series etcher.
CategoryEtch - 900eTegal
The Tegal 900e Series is a single-wafer cassette-to-cassette plasma etch system for non-critical plasma etch processes on 3 in to 150 mm wafers.
CategoryEtchWafer150mm - 983Tegal
The Tegal 983 is a diode plasma etch tool for pad passivation, oxide contact/via, spacer, polyimide ILD, and resist/SOG planarization applications.
CategoryEtchWafer125mmNodedown to 0.5 micron
