Ultratech
XLS 7800
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedA wafer stepper exposes a reticle image onto a wafer field, then advances the wafer to the next field and repeats the exposure. In this class of tool, the image is reduced optically during projection, and the exposure is used to define fine patterns in photoresist before later etch or deposition transfer steps.
Where it fits in the process flow
General reference — not yet source-verifiedThe tool sits in the front end of wafer patterning, after resist coating and prior to development and downstream pattern transfer. It is used where repeated exposure of many identical chip sites across a wafer is required.
Applications
The Ultratech XLS 7800 is used for semiconductor lithography on 200 mm silicon wafers.[3]
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the XLS 7800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the XLS 7800 are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the XLS 7800 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the XLS 7800 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the XLS 7800 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the XLS 7800 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Used GCA ULTRATECH XLS 7800 248nm DUV Stepper for Sale at Tara Semi... — tarasemi.comtarasemi.com
- [2]For Sale: GCA XLS 7800 248nm DUV Stepper | Used — photonicmicrodevices.comphotonicmicrodevices.com
- [3]Ultratech XLS 7800 DUV Wafer Stepper — microsystems.orgmicrosystems.org
- [4]Equipment inventory listing
Last updated Jul 30, 2026.
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View all →The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
